Characterization and analysis of high-quality 4H-SiC epitaxy suitable for the super-junction adopting “multiple epitaxy-channeling implantation” route
Fields of Study & Subjects
Silicon Carbide Semiconductor Technologies
Silicon and Solar Cell Technologies
Advanced Surface Polishing Techniques
Publication details
- Journal / source
- Journal of Crystal Growth
- Publisher
- Elsevier BV
- Volume
- 681
- Pages
- 128533–128533
- Publication date
- 13 February 2026
- Language
- EN