Design and integration of a DMD-based dual-telecentric optical system for sub-micron maskless lithography

Journal of Manufacturing Processes 2026

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Authors: Jinxin Duan, Zhiyuan Huang, Zenghao Lin, Jiachen Lv, Jing Qiao, Longqiu Li

DOI: 10.1016/j.jmapro.2026.03.075

Cited by: 2

References: 46

Fields of Study & Subjects

Advancements in Photolithography Techniques Nanofabrication and Lithography Techniques Advanced optical system design

References 46