Machine-learning-driven prediction and multi-objective optimization of Ta2O5 film performance in ion-assisted electron beam evaporation
Fields of Study & Subjects
Advanced Electron Microscopy Techniques and Applications
Electron and X-Ray Spectroscopy Techniques
Semiconductor materials and devices
Publication details
- Journal / source
- Journal of Manufacturing Processes
- Publisher
- Elsevier BV
- Volume
- 173
- Pages
- 950–967
- Publication date
- 10 July 2026
- Language
- EN