Fenton reaction-assisted chemical mechanical polishing of SiC wafer using gel disc with Al₂O₃‑SiO₂ core‑shell abrasives

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Authors: Lanxing Xu, Mingfeng Ke, Liang Zhao, Kaiping Feng, Yi-Xiang Wang, Tianchen Zhao, Binghai Lyu
Cited by: 1
References: 25

Fields of Study & Subjects

Advanced Surface Polishing Techniques Diamond and Carbon-based Materials Research Advanced machining processes and optimization

Publication details

Journal / source
Journal of Materials Processing Technology
Publisher
Elsevier BV
Volume
354
Pages
119400–119400
Publication date
27 June 2026
Language
EN