Impact of nitrogen plasma treatment on the TiN bottom electrode and ferroelectric properties of TiN/Hf0.5Zr0.5O2/TiN capacitors

Journal of Physics and Chemistry of Solids 2026 Open access

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Authors: Tung-Ming Pan, S.-S. Chuang, Wei-Che Weng, Jim-Long Her

DOI: 10.1016/j.jpcs.2026.113786

Cited by: 0

References: 36

Fields of Study & Subjects

Ferroelectric and Negative Capacitance Devices Semiconductor materials and devices MXene and MAX Phase Materials

References 36