Chemical etch resistance of sputter-deposited metal oxide thin film coatings in atomic hydrogen at 700 °C

Materials Chemistry and Physics 2026 Open access

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Authors: R. V. Pushkarev, Z.Silvester Houweling, Robbert W.E. van de Kruijs, Wesley T. E. van den Beld, Jacobus M. Sturm, Marcelo Ackermann, Fred Bijkerk
DOI: 10.1016/j.matchemphys.2026.132143
Cited by: 2
References: 45

Fields of Study & Subjects

Metal and Thin Film Mechanics Semiconductor materials and devices Diamond and Carbon-based Materials Research

Publication details

Journal / source
Materials Chemistry and Physics
Publisher
Elsevier BV
Volume
354
Pages
132143–132143
Publication date
31 January 2026
Language
EN