Neural network-driven bilayer image enhancement with adaptive aberration correction for lithography overlay metrology

Measurement 2026

View at publisher

Authors: Kai Meng, Haohao Wang, Hangying Zhang, Kai Wang, Peili Gao, Qingyu Meng, Kanglin Cao

DOI: 10.1016/j.measurement.2026.120380

Cited by: 0

References: 39

Fields of Study & Subjects

Advancements in Photolithography Techniques Optical Coatings and Gratings Surface Roughness and Optical Measurements

References 39