A systematic modeling approach based on skew ray tracing for optical measurement systems using geometrical optics and its applications in a six-DOF geometrical error measurement system for linear stages

Measurement 2026

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Authors: Wen-Huai Hsu, Yu-Cheng Tzeng, Chien-Sheng Liu
DOI: 10.1016/j.measurement.2026.120465
Cited by: 3
References: 26

Fields of Study & Subjects

Advanced Measurement and Metrology Techniques Optical measurement and interference techniques Advanced Surface Polishing Techniques

Publication details

Journal / source
Measurement
Publisher
Elsevier BV
Volume
267
Pages
120465–120465
Publication date
22 January 2026
Language
EN