Biaxial membrane stress evolution during pellicle mounting and stabilization in semiconductor manufacturing

Measurement 2026

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Authors: Yu Ching Lee, Nai Hsiang Hsing, Yu Xiang Zhang, Yen Chun Lo, You En Lin

DOI: 10.1016/j.measurement.2026.120880

Cited by: 0

References: 26

Fields of Study & Subjects

Optical measurement and interference techniques Advancements in Photolithography Techniques Advanced MEMS and NEMS Technologies

References 26