A review of nanoimprint lithography for improving the optical performance of solar cells

The need for improved photolithography resolution led the industry to develop systems that offer high resolution, high throughput and reduced costs. Among these systems nanoimprint lithography (NIL) stands out, offering lower costs than competing alternatives and low system complexity together with high throughput for large-area processing. With such advantages, NIL has the potential to be the technique that industrializes complex light-trapping schemes for the photovoltaic (PV) sector. Here, we review NIL processes that are used to implement structures that aim to improve optical absorption in the photovoltaic industry. We begin by reviewing its application in the commercially predominant PV technology – Silicon solar cells. Then, we review its implementation into thin film devices, such as amorphous-Si, CdTe and Cu( In , Ga )Se 2 and finalise by discussing its application in organic and perovskite solar cells. By the end, an in-depth overview of NIL processes to implement structures for improving solar cells light absorption capabilities is presented.