Reducing dynamic-RON and ΔVTH in GaN E-mode HEMTs by integrating p+-GaN/p-InGaN/p-GaN composite gate with gate termination extension: Simulation evidence
Fields of Study & Subjects
GaN-based semiconductor devices and materials
Silicon Carbide Semiconductor Technologies
Advancements in Semiconductor Devices and Circuit Design
Publication details
- Journal / source
- Micro and Nanostructures
- Volume
- 214
- Pages
- 208641–208641
- Publication date
- 4 March 2026
- Language
- EN