Cap-layer engineering in AlGaN/GaN HEMTs with AlN buffer for enhanced breakdown and Johnson Figure of Merit

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Authors: Ellapu Bhanu Prakash, Anil Prasad Dadi, Vijay Maitra, Tathagata Ghose, Ashok K Ray, Sushanta Bordoloi
Cited by: 5
References: 52

Fields of Study & Subjects

GaN-based semiconductor devices and materials Silicon Carbide Semiconductor Technologies Advancements in Semiconductor Devices and Circuit Design

Publication details

Journal / source
Materials Science and Engineering B
Publisher
Elsevier BV
Volume
327
Pages
119223–119223
Publication date
22 January 2026
Language
EN