Performance improvements in All-2D Te field effect transistor with layer-engineered homojunction using sputtering deposition

Materials Science in Semiconductor Processing 2026

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Authors: Min Jeong Kim, Ojun Kwon, S. K. OH, Eunjeong Cho, Eunjeong Cho, Wondeok Seo, Yeongeun Kwon, Shinhoi Kim, Minhee Kim, Kyungmin Lee, Minyoung Choi, Ah Ra Kim
+3 more Jongwon YOON, Woojin Park, Byungjin Cho
DOI: 10.1016/j.mssp.2026.110443
Cited by: 1
References: 54

Fields of Study & Subjects

Topological Materials and Phenomena 2D Materials and Applications Phase-change materials and chalcogenides

Publication details

Journal / source
Materials Science in Semiconductor Processing
Publisher
Elsevier BV
Volume
206
Pages
110443–110443
Publication date
19 January 2026
Language
EN