A review of plasma-induced damage and interface recovery in GaN-based materials etching processes

Materials Science in Semiconductor Processing 2026

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Authors: Jong Woo Hong, Jong Yong Park, Chan Ho Kim, Woong Sun Lim, Woong Sun Lim, Doo San Kim, Ja Yeon Kim, Doo San Kim, Doo San Kim, Geun Young Yeom, Dong Woo Kim
DOI: 10.1016/j.mssp.2026.110568
Cited by: 3
References: 91

Fields of Study & Subjects

GaN-based semiconductor devices and materials Plasma Diagnostics and Applications Ga2O3 and related materials

Publication details

Journal / source
Materials Science in Semiconductor Processing
Publisher
Elsevier BV
Volume
209
Pages
110568–110568
Publication date
12 March 2026
Language
EN