MOCVD growth and computational fluid dynamics simulations of atomically thin MoS2 layers

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Authors: Tao Sang, Xiaokun He, Lintao Li, Renwei Jing, Wei Lyu, Jianhong Zhang, Fangcheng Xu, Jie Wang, Yufeng Hao
Cited by: 0
References: 48

Fields of Study & Subjects

2D Materials and Applications Advanced Materials and Semiconductor Technologies Graphene research and applications

Publication details

Journal / source
Materials Science in Semiconductor Processing
Volume
209
Pages
110595–110595
Publication date
13 March 2026
Language
EN