HF-based metal-assisted chemical etching for high-aspect-ratio silicon micro/nanostructures: Mechanisms, parameter mapping, and manufacturing considerations

Materials Science in Semiconductor Processing 2026

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Authors: Daojiang Yu, Chongteng Zhang, Youkang Shen, Liyi Li

DOI: 10.1016/j.mssp.2026.110646

Cited by: 1

References: 122

Fields of Study & Subjects

Nanowire Synthesis and Applications Silicon Nanostructures and Photoluminescence Silicon and Solar Cell Technologies

References 122