MgH2 thin films and nanowires deposited by CVD from a magnesium diamidodiboranate precursor

Magnesium hydride, MgH 2 , is deposited by chemical vapor deposition (CVD) at substrate temperatures of 140-300 °C from the newly synthesized magnesium diamidodiboranate precursor, Mg(NMe 2 BH 2 NMe 2 BH 3 ) 2 , abbreviated Mg(NBNB) 2 . The resulting films are pure, single-phase MgH 2 as evidenced by X-ray diffraction and Raman spectroscopy. Depending on the growth conditions, the morphology of the deposits can be varied from a granular film to islands to a continuous film with either protruding pillars or nanowires. The deposits are nanocrystalline and consist of pure, polycrystalline α-MgH 2 under all conditions. The formation of MgH 2 from Mg(NBNB) 2 is thought to involve a hydrogen elimination mechanism involving the BH 2 or BH 3 groups.