Atomic layer removal in silver via heating

Read full text
Authors: Xiaowei Liu, Jitao Shang, Hao Chen, Yuyang Yin, Xiaoliang Zeng, Yingwei Li, Sheng Liu, Jian Lü
Cited by: 0
References: 39

Abstract

Artificial intelligence triggered device miniaturization and it requires materials to be processed easily and the associate fabrication techniques of much high precision, approaching atomic scale precision. However, thermal performances of materials at small scale are essential to the fabrication process. Although researchers have tried to apply sublimation of materials as potential atomic scale fabrication technique for device miniaturization, there exists limited controllability for possible applications. In this work, we studied the thermal performances of silver nanowires (Ag NWs) under in situ transmission electron microscopy (TEM) and found two distinctive but inherently related phenomena. The Ag NWs evaporated discontinuously at nano scale and left with sharp edges of Ag (111) plane. With high resolution TEM imaging, the atomic Ag (111) planes sublimate layer by layer. Furthermore, the sublimation rate of atomic Ag (111) plane is analyzed for faithful controllability. Thus so, such atomic layer removal (ALR) process in silver achieved simply by heating has great potential to be used as efficient atomic manufacturing technique to promote device miniaturization to facilitate the blooming artificial intelligence.

Fields of Study & Subjects

Nanofabrication and Lithography Techniques Nanomaterials and Printing Technologies Surface and Thin Film Phenomena

Publication details

Journal / source
Nano Materials Science
Publication date
1 January 2026
Language
EN