Optimized mask design for inverse lithography via level-set normalized gradient descent

Optics Communications 2026

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Authors: Yixin Yang, Liangcai Cao

DOI: 10.1016/j.optcom.2026.133038

Cited by: 1

References: 41

Fields of Study & Subjects

Advancements in Photolithography Techniques Advanced optical system design VLSI and FPGA Design Techniques

References 41