Hi-ILT: A hybrid End-to-End framework of lightweight hierarchical VAE and physics-Guided ILT for inverse lithography technology

Optics and Lasers in Engineering 2026

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Authors: Hui Xu, Tao Wang, Ziqiang Zhao, Ruijun Ma, Xiaoqing Wen, Huaguo Liang

DOI: 10.1016/j.optlaseng.2026.109621

Cited by: 1

References: 17

Fields of Study & Subjects

Advancements in Photolithography Techniques Advanced Neural Network Applications Physical Unclonable Functions (PUFs) and Hardware Security

References 17