Development of an optical critical dimension (OCD) measurement model enhanced by transformer-based data augmentation

Optics & Laser Technology 2026

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Authors: Jinyang Li, Dengji Guo, Ta-Cheng Mo, Yu-Hsiang Hsu, Changliang Zhu, Shien‐Ping Feng, Hung-Fei Kuo

DOI: 10.1016/j.optlastec.2026.114857

Cited by: 1

References: 23

Fields of Study & Subjects

Optical Coatings and Gratings Advancements in Photolithography Techniques Surface Roughness and Optical Measurements

References 23