Boosted H2O2 activation to dissociated hydroxyl radical by regulating B sites in copper-based delafossite for contaminants degradation: Key role on adsorption configuration and occurrence forms

Separation and Purification Technology 2026

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Authors: Jin Li, Haoran Zhang, Sihao Fu, Y. Wang, Kun Liu, Yujiao Liu, Tianjie Su, Lingyu Meng, Guocheng Liu, Qinghua Yan, Chengzhi Zhou, Yanjun Xin
+1 more Shuaishuai Xin
DOI: 10.1016/j.seppur.2026.137120
Cited by: 1
References: 39

Fields of Study & Subjects

Advanced oxidation water treatment Copper-based nanomaterials and applications Adsorption and biosorption for pollutant removal

Publication details

Journal / source
Separation and Purification Technology
Publisher
Elsevier BV
Volume
392
Pages
137120–137120
Publication date
6 February 2026
Language
EN