Trimeric surfactants with high surface activity enable outstanding silicon wafer post-CMP cleaning performance

Separation and Purification Technology 2026

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Authors: Bin Hu (122268), Jiani Liu, Xin Zhang (35492), Lvming Qiu, Min Gong, Youmei Xing, Yunjian Yin, Weihua Fang, Zhen Wu, Guojie Wang

DOI: 10.1016/j.seppur.2026.138880

Cited by: 3

References: 50

Fields of Study & Subjects

Advanced Surface Polishing Techniques Nanofabrication and Lithography Techniques Copper Interconnects and Reliability

References 50