Enhanced Ion/Ioff ratio and controlled threshold voltage in multi-layer MoS2 transistors thinned by a reactive-ion etching process

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Authors: Changwoo Lee, Dae‐Young Jeon
Cited by: 0
References: 18

Fields of Study & Subjects

2D Materials and Applications Graphene research and applications Advancements in Semiconductor Devices and Circuit Design

Publication details

Journal / source
Solid State Communications
Volume
411
Pages
116376–116376
Publication date
24 February 2026
Language
EN