Retaining crystallinity of as-deposited thermoelectric Fe2VAl-based thin films grown from DCMS and HiPIMS

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Authors: Ludwig Enzlberger, B. Schmid, Lisa Mitterhuber, Tomasz Wójcik, S. Kolozsvári, P.H. Mayrhofer
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References: 31

Abstract

Thermoelectric materials have gained much attention in recent years due to their ability to directly interconvert electrical and thermal energy via the Seebeck/Peltier effect. Their appeal for application in energy harvesting and solid-state cooling is however currently held back, as current state-of-the-art systems rely on rare and/or hazardous elements. Efforts to replace them with more abundant and environmentally benign alternatives have shown Heusler-alloys to be attractive candidates with thin film Fe 2 V 0.8 W 0.2 Al achieving a massive Figure of Merit, but requiring extensive post-processing to achieve crystallinity. Here, we report the direct deposition of this material in a crystalline, fully disordered W-type body-centered cubic (bcc) structure using direct current magnetron sputtering (DCMS) and high-power impulse magnetron sputtering (HiPIMS). Structural analyses confirm the formation of crystalline Heusler Phases in the as-deposited state, even at room temperature, eliminating the need for prolonged annealing. Transport measurements reveal low thermal conductivity (2.12 W/m∙K), low resistivity (≈240 μΩ∙cm) and a moderate Seebeck-coefficient (−55 μV/K), resulting in a viable Figure of Merit (ZT ≈ 0.1). These findings demonstrate an energy-efficient route in the fabrication of thermoelectric thin films from earth-abundant, non-toxic elements to be used for sustainable energy conversion. • Crystalline and fully disordered W-type bcc-Fe 2 V 0.8 W 0.2 Al in all cases from room temperature up to 500°C in the as-deposited state • Demonstrated the viability of HiPIMS for the production of thermoelectric thin films from non-toxic and earth-abundant elements • Low thermal conductivity (≈ 2 W/m∙K) and moderate Seebeck-coefficient (up to -55 μV /K) lead to a viable Figure of Merit (≈ 0.1) • Increase in deposition pressure appears overall beneficial and leads to an increase in thermopower and a decrease in thermal conductivity • Identified competing growth of (220)- and (440)-orientation linked to deposition parameters and Al-deficiency

Fields of Study & Subjects

Advanced Thermoelectric Materials and Devices Heusler alloys: electronic and magnetic properties Thermal properties of materials

Publication details

Journal / source
Surface and Coatings Technology
Volume
522
Pages
133200–133200
Publication date
14 January 2026
Language
EN