Advancing atomic layer deposition through artificial intelligence: Generative modeling and predictive analytics for TiO2 growth rate prediction from TDMAT/O3

Surface and Coatings Technology 2026

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Authors: Remya Ampadi Ramachandran, Pouyan Navabi, Majid Jaberi‐Douraki, Urmila M. Diwekar, Cortino Sukotjo, Christos G. Takoudis

DOI: 10.1016/j.surfcoat.2026.133341

Cited by: 0

References: 34

Fields of Study & Subjects

Machine Learning in Materials Science Semiconductor materials and devices Advanced Materials and Semiconductor Technologies

References 34