Atomic layer deposition of aluminum oxide revisited: Trimethylaluminum reactivity on silicon oxide surfaces at cryogenic temperatures

Surfaces and Interfaces 2026

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Authors: Leonhard Winter, Ravi Ranjan, Francisco Zaera

DOI: 10.1016/j.surfin.2026.108415

Cited by: 0

References: 50

Fields of Study & Subjects

Semiconductor materials and devices Silicon and Solar Cell Technologies Advanced Chemical Physics Studies

References 50