Study on Interdiffusion at the interface between HZO and IGZO layers

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Authors: Hye Joo Kang, Seung Wook Ryu, Il‐Kwon Oh
Cited by: 0
References: 20

Fields of Study & Subjects

Ferroelectric and Negative Capacitance Devices Semiconductor materials and devices Thin-Film Transistor Technologies

Publication details

Journal / source
Surfaces and Interfaces
Volume
86
Pages
108737–108737
Publication date
11 February 2026
Language
EN