Elucidating the super-cycle mechanism in atomic layer growth of HfAlOx ternary metal oxide from an ab-initio study

Surfaces and Interfaces 2026

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Authors: Yunseok Kim, Seulwon Choi, Ho Jun Kim, Hwanyeol Park

DOI: 10.1016/j.surfin.2026.108806

Cited by: 0

References: 49

Fields of Study & Subjects

Semiconductor materials and devices Copper Interconnects and Reliability Ferroelectric and Negative Capacitance Devices

References 49