Nondestructive analysis of Al2O3/SiOx/Si passivation layers for photovoltaics using angle-resolved XPS and HAXPES techniques

Surfaces and Interfaces 2026 Open access

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Authors: I-Chia Huang, Ting-Jia Yang, Pei-Chen Huang, Ting-Jia Yang, Chia-Chien Kuo, Jing-Jong Shyue, Hsun-Yun Chang, Yu-Chun Huang, I-Yu Huang, Hsin-Chu Chen, Wei‐Chun Lin
DOI: 10.1016/j.surfin.2026.109215
Cited by: 0
References: 27

Fields of Study & Subjects

Electron and X-Ray Spectroscopy Techniques Silicon and Solar Cell Technologies Integrated Circuits and Semiconductor Failure Analysis

Publication details

Journal / source
Surfaces and Interfaces
Publisher
Elsevier BV
Volume
95
Pages
109215–109215
Publication date
8 April 2026
Language
EN