Investigation of etch front morphology evolution for high-aspect-ratio deep silicon etching by uniform metal-assisted Chemical Etching

Surfaces and Interfaces 2026

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Authors: Daojiang Yu, Chongteng Zhang, Youkang Shen, L M Li

DOI: 10.1016/j.surfin.2026.109425

Cited by: 1

References: 30

Fields of Study & Subjects

Nanowire Synthesis and Applications Plasma Diagnostics and Applications Advanced MEMS and NEMS Technologies

References 30