Directed block copolymer self-assembly for next-generation lithography

Trends in Chemistry 2026

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Authors: Duzhao Han, Yuxin Zhao, Bing Luo, Yuping Wu, Wei Tang
DOI: 10.1016/j.trechm.2026.01.004
Cited by: 2
References: 73

Fields of Study & Subjects

Block Copolymer Self-Assembly Organic Electronics and Photovoltaics Advanced Polymer Synthesis and Characterization

Publication details

Journal / source
Trends in Chemistry
Publisher
Elsevier BV
Volume
8
Issue
3
Pages
233–245
Publication date
1 March 2026
Language
EN