Preparation of microstructures for gallium oxide photonic devices

Recent studies show great interest in improving photonic components and devices performance. One of the way how to advance is integration of new materials. One of the promising material for new field of photonics is gallium oxide (Ga 2 O 3 ). Ga 2 O 3 shows interesting wide band gap and high performance properties which can be used mainly in detectors, photonics elements, space applications etc. Photonic application of gallium oxide still was not well analyzed and only few studies have been published. This paper shows process of creating photonic elements, microstructures as gratings and waveguides, prepared on positive photoresist with greyscale laser lithography (GLL) experimental setup. Prepared structures are examined with confocal scanning laser microscope (CSLM). Structures on Ga 2 O 3 will undergo reactive ion etching (RIE) for manufacturing photonic components based on Ga 2 O 3 .