Corrigendum to “Investigating the impact of rapid thermal annealing atmosphere on the properties of sputtered SnO thin films with a tellurium capping layer” [Vacuum 247 (2026) 115148]

Vacuum 2026

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Authors: Bojun Zhang, Kai‐Jhih Gan, Zefu Zhao, Jialong Xiang, Zhibo Zeng, Kuei‐Shu Chang‐Liao, Chao-Yi Fang, Dun‐Bao Ruan

DOI: 10.1016/j.vacuum.2026.115174

Cited by: 0

Fields of Study & Subjects

Thin-Film Transistor Technologies ZnO doping and properties Chalcogenide Semiconductor Thin Films