Pressure-driven gas phase transport and wafer rotation effects in LPCVD TEOS-SiO2 trench filling for CMOS STI applications
Fields of Study & Subjects
Copper Interconnects and Reliability
Semiconductor materials and devices
Silicon and Solar Cell Technologies
Publication details
- Journal / source
- Vacuum
- Publisher
- Elsevier BV
- Volume
- 250
- Pages
- 115322–115322
- Publication date
- 3 April 2026
- Language
- EN