Pressure-driven gas phase transport and wafer rotation effects in LPCVD TEOS-SiO2 trench filling for CMOS STI applications

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Authors: Fatma Betül Akgül Taner
Cited by: 1
References: 19

Fields of Study & Subjects

Copper Interconnects and Reliability Semiconductor materials and devices Silicon and Solar Cell Technologies

Publication details

Journal / source
Vacuum
Publisher
Elsevier BV
Volume
250
Pages
115322–115322
Publication date
3 April 2026
Language
EN