Improving film thickness uniformity on curved substrates via planar and cylindrical magnetron sputtering: Simulation and experimental validation
Fields of Study & Subjects
Advanced X-ray Imaging Techniques
Nuclear Physics and Applications
Surface Roughness and Optical Measurements
Publication details
- Journal / source
- Vacuum
- Publisher
- Elsevier BV
- Volume
- 250
- Pages
- 115337–115337
- Publication date
- 7 April 2026
- Language
- EN