Mist Chemical Vapor Deposition: A Novel Solution-Based Film Deposition Technique
Fields of Study & Subjects
Copper Interconnects and Reliability
Semiconductor materials and devices
Optical Coatings and Gratings
Publication details
- Journal / source
- Crystal Growth & Design
- Publisher
- American Chemical Society (ACS)
- Volume
- 26
- Issue
- 10
- Pages
- 4094–4110
- Publication date
- 1 May 2026
- Language
- EN