Mist Chemical Vapor Deposition: A Novel Solution-Based Film Deposition Technique

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Authors: Guoqiang Yi, Zhen Lu, Ying Chang, Jiarui Yan, Tahta Amrillah, Xiaojie Qiao, Zaichun Sun
Cited by: 3
References: 95

Fields of Study & Subjects

Copper Interconnects and Reliability Semiconductor materials and devices Optical Coatings and Gratings

Publication details

Journal / source
Crystal Growth & Design
Publisher
American Chemical Society (ACS)
Volume
26
Issue
10
Pages
4094–4110
Publication date
1 May 2026
Language
EN