Synthesis, Characterization, and Electron-Beam Lithography of Tetakis(Triphenylstannyl) Orthosilicate and Tetrakis(Triacetoxystannyl) Orthosilicate for the Development of Inorganic Molecular EUV Resists

Inorganic Chemistry 2026

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Authors: Jiyoung Bang, Hyeok Yun, Soyeong Heo, Yusun Won, Seunghwan Kang, Hyuntae Jung, Hyun‐Dam Jeong
DOI: 10.1021/acs.inorgchem.6c00250
Cited by: 1
References: 55

Abstract

, respectively. These results indicate that tetrakis(triacetoxystannyl) orthosilicate is a promising inorganic molecular photoresist candidate for EUV lithography.

Fields of Study & Subjects

Advancements in Photolithography Techniques Nanofabrication and Lithography Techniques Copper Interconnects and Reliability

Publication details

Journal / source
Inorganic Chemistry
Publisher
American Chemical Society (ACS)
Volume
65
Issue
20
Pages
10936–10947
Publication date
14 May 2026
Language
EN