Environmentally Adaptive Lubrication of MoS 2 –WS 2 Films through Composition-Controlled Crystal Orientation
Abstract
Significant efforts have been dedicated to improving the tribological performance of thin films in both atmospheric and vacuum environments. However, property differences between individual components in films often lead to microstructural defects and interfacial mismatches, thereby limiting the tribological performance. In this work, MoS 2 –WS 2 films are precisely deposited via a multimagnetron cosputtering system. A crystal orientation design approach, implemented through fine-tuning of the WS 2 /MoS 2 ratio during deposition, is employed to construct two-dimensional (2D) transition-metal dichalcogenide (TMD) films. The effects of the WS 2 /MoS 2 ratio on the morphology, structural characteristics, and tribological properties of the as-prepared films are systematically investigated. It is demonstrated that a narrow optimal WS 2 /MoS 2 range is critically required to achieve the observed environmentally adaptive lubrication, which is characterized by a stable friction coefficient below 0.08 and a wear rate under 3.0 × 10 –16 m 3 ·N –1 ·m –1 over 30,000 cycles in both humid air and vacuum environments. This composition-controlled process creates a ternary alloy that can promote the favorable alignment of the (002) basal plane parallel to the substrate. Systematic investigation reveals that excellent environmentally adaptive lubrication in MoS 2 –WS 2 films occurs only within a narrow, optimal range of WS 2 /MoS 2 ratios. The distinctive lubrication behavior of the composite films stems from their capacity to maintain a pristine layered structure in vacuum while generating mildly oxidized tribo-films in air. This finding establishes a novel surface engineering strategy offering a feasible and generalizable design concept for long-life, adaptive lubrication films.
Fields of Study & Subjects
Metal and Thin Film Mechanics
2D Materials and Applications
Tribology and Wear Analysis
Publication details
- Journal / source
- Langmuir
- Publisher
- American Chemical Society (ACS)
- Volume
- 42
- Issue
- 17
- Pages
- 12097–12107
- Publication date
- 18 April 2026
- Language
- EN