Self-Consistent Electrostatic Modeling of Gated Narrow-Gap Topological Insulators

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Authors: Maximilian Hofer, Christopher Fuchs, Moritz Siebert, Christian Berger, Lena Fürst, Martin Stehno, S. Schreyeck, H. Buhmann, T. Kießling, Wouter Beugeling, Laurens W. Molenkamp
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References: 48

Abstract

Even small electrostatic potentials can dramatically influence the band structure of narrow-gap semiconductors. A quantitative understanding often necessitates a self-consistent Hartree approach. The valence and conduction band states strongly hybridize and/or cross in these systems. This results in failure of the standard effective-mass theory, which relies on a clear distinction between electrons and holes and assumes a flat charge carrier distribution at the charge neutrality point. We show that the alternative full-band envelope-function approach [Andlauer and Vogl Phys. Rev. B, 2009, 80, 035304], which we have implemented into the open-source band structure software package kdotpy [Beugeling et al. SciPost Phys. Codebases, 2025, 47], gives numerically stable and quantitatively accurate results where the conventional method fails. We find excellent agreement in modeling the experimental subband density evolution with top-gate voltage in thick (26 nm–107 nm), topologically inverted HgTe quantum wells. We expect our openly available implementation to greatly benefit the investigation of narrow-, broken-, and inverted-gap materials.

Fields of Study & Subjects

Topological Materials and Phenomena 2D Materials and Applications Advanced Thermoelectric Materials and Devices

Publication details

Journal / source
Nano Letters
Publisher
American Chemical Society (ACS)
Volume
26
Issue
9
Pages
3042–3048
Publication date
19 February 2026
Language
EN