Atomic and Electronic Structure of Strongly Charged Domain Walls in van der Waals α-In 2 Se 3

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Authors: Gillian Nolan, Edmund Han, Shahriar Muhammad Nahid, Patrick Carmichael, Arend M. van der Zande, André Schleife, Pinshane Y. Huang
Cited by: 1
References: 43

Abstract

Here, we use atomic resolution scanning transmission electron microscopy (STEM) and first-principles calculations to study the atomic and electronic structure of strongly charged domain walls in α-In 2 Se 3 . STEM imaging and density functional theory (DFT) show that head-to-head (HH) domain walls contain a layer of β/β'-In 2 Se 3, whereas tail-to-tail (TT) domain walls are atomically abrupt. We apply 4D STEM and multislice electron ptychography to map ferroelectric domains in 2D and 3D, showing that nearly 180° domain walls exhibit complex, curved 3D structures that differ from ideal 180° structures. First-principles simulations predict localized conducting states within an ∼1 nm thick layer at both HH and TT domain walls, such as a midgap state at the β layer of the HH domain wall. These properties make strongly charged domain walls in α-In 2 Se 3 excellent candidates for realizing 2D electron or hole gases and domain wall engineering in van der Waals ferroelectrics.

Fields of Study & Subjects

2D Materials and Applications Chalcogenide Semiconductor Thin Films Solid-state spectroscopy and crystallography

Publication details

Journal / source
Nano Letters
Publisher
American Chemical Society (ACS)
Volume
26
Issue
16
Pages
5459–5467
Publication date
20 April 2026
Language
EN