Leakage-Induced Space-Charge Accumulation and Interfacial Field Redistribution in a Dielectric Nanocapacitor Revealed by Operando Electron Holography

Nano Letters 2026 Open access

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Authors: Bérangère Disic, Kilian Gruel, Aurélien Masseboeuf, L Zhang, Raphaël Serra, Martin Hÿtch, Christophe Gatel
DOI: 10.1021/acs.nanolett.6c00753
Cited by: 1
References: 47

Abstract

framework based on electron holography for probing nanoscale electrical properties and disentangling competing leakage mechanisms in advanced micro- and nanoscale capacitors.

Fields of Study & Subjects

Advanced Electron Microscopy Techniques and Applications Dielectric materials and actuators Force Microscopy Techniques and Applications

Publication details

Journal / source
Nano Letters
Publisher
American Chemical Society (ACS)
Volume
26
Issue
15
Pages
5266–5274
Publication date
13 April 2026
Language
EN