Scalable Quantum Current Source on Commercial CMOS Process Technology

Many technologies require a precise electrical current standard that at present is achieved indirectly through voltage and resistance standards. Silicon-based charge pumps could provide a direct electrical standard that scales inherently through their compatibility with complementary metal oxide semiconductor (CMOS) fabrication methods. However, coherent quantized charge transfer has so far been demonstrated only in nanoscale devices that are custom-fabricated in academic cleanrooms or research technology foundries. Here, we show that a CMOS device manufactured with a commercial 22 nm process node can be used to realize a quantum current standard in the International System of Units (SI). We measure the accuracy of two parallel-connected charge pumps with reference to SI-traceable voltage and resistance standards in a pumped helium system. This translation of low-temperature quantum effect device concepts from scientific research into an industrial fabrication context opens a path toward advancing quantum electrical metrology and quantum hardware engineering.