Amorphization-Mediated Si-I to Si-V Phase Transition and Reversible Amorphous Si-V Phase Memory in Silicon Nanoparticles

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Authors: Ziye Deng, Reza Namakian, Wei Lin Gao
Cited by: 0
References: 45

Abstract

Abstract An experiment has shown that ∼10 nm Si nanoparticles undergo a Si–I (diamond cubic) to Si–V (simple hexagonal) phase transition under compression, in contrast to the Si–I to Si–II (tetragonal) transition observed in bulk silicon. However, the atomistic mechanism underlying this size-dependent transition pathway remains unclear. Here, we employ molecular dynamics simulations with a machine learning interatomic potential to reveal a stress triaxiality-driven, two-step Si–I to Si–V transition pathway in a spherical Si nanoparticle subjected to an idealized triaxial contact loading model. An intermediate amorphous phase nucleates at the nanoparticle surface and propagates inward around the Si–I core in regions of low stress triaxiality dominated by shear. Within this amorphous shell, Si–V recrystallizes at locations with increased stress triaxiality and hydrostatic pressure. Upon unloading, the Si–V structure transforms into an amorphous state. A subsequent loading–unloading cycle applied to this amorphous nanoparticle reveals a reversible amorphous-to-Si–V transformation, demonstrating a nanoscale phase memory effect.

Fields of Study & Subjects

Silicon Nanostructures and Photoluminescence Thin-Film Transistor Technologies Semiconductor materials and interfaces

Publication details

Journal / source
Nano Letters
Publisher
American Chemical Society (ACS)
Volume
26
Issue
38
Pages
12702-12708
Publication date
15 September 2026
Language
EN