Interlayer Stacking-Controlled Magnetism in Van der Waals Antiferromagnets

View at publisher
Authors: Guopeng Wang, Yupeng Ma, Hengli Duan, Rong Hu, Yu Tao, Shaohua Yang, Han Zhong, Jianlin Wang, Dongsheng Song, Yona Soh, Tianlun Yu, Bin Lei
+4 more Yimin Xiong, Pai Li, Yalin Lu, Mingliang Tian
Cited by: 1
References: 53

Abstract

Interlayer stacking in van der Waals (vdW) magnets offers a powerful route to tailor magnetic interactions and emergent functionalities. Here, we show that transitions from aperiodic AA/AB stacking to long-range periodic 6R order govern the coexistence and competition of ferromagnetic and antiferromagnetic ground states in room-temperature vdW antiferromagnets. Stacking-controlled interlayer coupling and symmetry breaking redefine the intrinsic origins of ferromagnetism. Atomically thin flakes with distinct stacking sequences exhibit unconventional magnetic behavior that is different from the established odd–even-layer effect in vdW antiferromagnets. Moreover, stacking-dependent magnetic competition reverses the sign of magnetoresistance (negative to positive). Importantly, all thin flakes maintain magnetic order above room temperature, with a T C of ∼340 K observed in the monolayer flake. These findings establish stacking sequences as a deterministic handle for engineering magnetic and transport properties, enabling the design of high-temperature stacking-programmable spintronic devices.

Fields of Study & Subjects

2D Materials and Applications Topological Materials and Phenomena Graphene research and applications

Publication details

Journal / source
ACS Nano
Publisher
American Chemical Society (ACS)
Volume
20
Issue
7
Pages
6052–6062
Publication date
12 February 2026
Language
EN