Complex 2D Square Nanopatterns via Intrinsic Anisotropic Confinement

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Authors: Yu Hong Shao, Bo Hou, Qingshu Dong, Qingliang Song, Yufeng Wu, Yang Xu, Weihua Li, Wenbin Zhang
Cited by: 1
References: 74

Abstract

Square patterns are integral to industry-standard rectilinear coordinate systems, yet fabricating complex two-dimensional (2D) square patterns remains a formidable challenge. Herein, we report the emergence of complex 2D nanopatterned morphologies with p 4 mm and p 4 gm plane group symmetries and ultrasmall feature sizes (∼3 nm) in three-component bolaform giant surfactants which consist of a central polystyrene chain flanked by a perfluoroalkyl-functionalized polyhedral oligomeric silsesquioxane (FPOSS) at one terminus and a size-tunable oligosiloxane-functionalized POSS (Si x POSS) at the other. The structural evolution proceeds through a hierarchical phase-separation mechanism: an initial primary segregation between the highly immiscible FPOSS and mixed PS/Si x POSS domain is followed by secondary phase separation between the weakly incompatible PS and Si x POSS within their shared nanoconfined region. Successful formation of these unconventional structures relies on a hierarchy of interaction strengths to direct self-assembly at different length scales and on the intrinsic anisotropic confinement formed in situ. The final morphology is sensitive to molecular parameters such as size, shape, and volume asymmetry of the terminal nanoparticles. This work establishes a versatile molecular platform for engineering complex 2D superlattices, offering a promising avenue for advanced nanolithography and integrated circuit fabrication in industry.

Fields of Study & Subjects

Silicone and Siloxane Chemistry Mesoporous Materials and Catalysis Block Copolymer Self-Assembly

Publication details

Journal / source
ACS Nano
Publisher
American Chemical Society (ACS)
Volume
20
Issue
2
Pages
2475–2483
Publication date
2 January 2026
Language
EN