Stress-driven photo-reconfiguration of surface microstructures via vectorial field-guided lithography

Pattern formation driven by mechanical stress plays a fundamental role in shaping structural organization in both natural and human-made systems. Using light as a vectorial stimulus may offer a powerful route to control stress-induced pattern formation in materials. However, achieving localized, programmable, and predictable control of individual microstructures via structured polarization fields has remained a major challenge. Here, we introduce vectorial field-guided lithography, a novel approach that leverages fully structured polarization fields as lithographic tools to enable the stress-driven reconfiguration of pre-patterned azopolymer microstructures with an unprecedented degree of flexibility, complexity, and diversity. By building on the Viscoplastic PhotoAlignment model, which describes the azopolymer deformation as a stress response to structured light, we quantitatively demonstrate and predict complex surface architectures generated by programmable light-induced stress pathways using a digital polarization rotator implemented via a spatial light modulator. We model and experimentally achieve single-step formation of anisotropic, bent, and chiral microstructures from a single pre-patterned geometry. Our results reveal an exceptional control over local microstructure morphology and establish, for the first time, a comprehensive theoretical framework capable of quantitatively designing and fabricating target morphologies on azopolymers. This work moves beyond conventional intensity-based photopatterning and demonstrates that the full vectorial nature of light can dictate the mechanical reshaping of functional polymer surfaces, providing a new platform for the programmable design of complex microarchitectures with applications in photonics, microfluidics, and biology.