B7-H3 promotes skin photodamage through ITGA2-NRF2-TFAM-mediated mitochondrial oxidative stress

Read full text
Authors: Yuanyuan Jia, Qiange Zhang, Fangying Su, Yuan Zhu, Siji Chen, Jingyi Yang, Qiuyu Mao, Yiwen Zhang, Yuting Yang, Sisi Ding, Cuiping Liu, Xueguang Zhang
+3 more Dan Luo, Wei Min, Lei Cao
Cited by: 1
References: 64

Abstract

Ultraviolet radiation (UVR) exposure drives skin photodamage, which constitutes the fundamental basis of both photoaging and photocarcinogenesis, by disrupting mitochondrial homeostasis and inducing reactive oxygen species (ROS) accumulation. Although B7-H3 (CD276) is recognized as an immune-checkpoint molecule involved in tumor metabolism, its role in UVR-induced cutaneous photodamage and the associated redox imbalance remains undefined. Here we show that B7-H3 is elevated in acute and chronic photodamaged human skin as well as in UVR-induced mouse (female) and cell models. Genetic deletion or antibody blockade of B7-H3 attenuates ROS accumulation, preserves mitochondrial function, and reduces photodamage. Mechanistically, B7-H3 interacts with integrin α2 (ITGA2) to impair antioxidant signaling by inhibiting the nuclear translocation of nuclear factor erythroid 2-related factor 2 (NRF2) and disrupting the nuclear respiratory factor 1 (NRF1)-transcription factor A, mitochondrial (TFAM) pathway, ultimately disrupting mitochondrial biogenesis and redox balance. Furthermore, treatment with an anti-B7-H3 blocking monoclonal antibody alleviates photodamage and preserves mitochondrial function. Collectively, these findings indicate that the skin-resident B7-H3/ITGA2 interaction contributes to photodamage via disrupting TFAM expression, suggesting that targeting B7-H3 may represent a promising therapeutic strategy for skin photodamage and related disorders.

Fields of Study & Subjects

Skin Protection and Aging Nonmelanoma Skin Cancer Studies Photodynamic Therapy Research Studies

Publication details

Journal / source
Communications Biology
Publisher
Springer Science and Business Media LLC
Volume
9
Issue
1
Publication date
28 May 2026
Language
EN