Effect of substrate rotation and offset on film thickness uniformity in concave-target magnetron sputtering

CrystEngComm 2026

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Authors: Jiachen Dong, Baozhang Zhao, Fan Sheng, Pei Li, Li Ang Zhang, Wei Zou, Mei Wang, Zhengwang Cheng
DOI: 10.1039/d5ce01219h
Cited by: 1
References: 30

Abstract

The synergistic effect of substrate rotation and target–substrate offset were investigated and designed to further improve the thickness uniformity of the magnetron-sputtered films with a concave target applied.

Fields of Study & Subjects

Optical Coatings and Gratings Metal and Thin Film Mechanics Copper Interconnects and Reliability

Publication details

Journal / source
CrystEngComm
Publisher
Royal Society of Chemistry (RSC)
Volume
28
Issue
20
Pages
3241–3246
Publication date
1 January 2026
Language
EN