Analysis of metal-assisted chemical etching for microscale Si structures using Arrhenius method
Abstract
), highlighting the efficiency of catalytic charge injection and transport in MACE. This quantitative analysis provides new insights into the fundamental mechanism of MACE and offers practical guidance for optimizing microscale three-dimensional Si fabrication processes.
Fields of Study & Subjects
Plasma Diagnostics and Applications
Silicon and Solar Cell Technologies
Nanowire Synthesis and Applications
Publication details
- Journal / source
- Physical Chemistry Chemical Physics
- Publisher
- Royal Society of Chemistry (RSC)
- Volume
- 28
- Issue
- 3
- Pages
- 2615–2620
- Publication date
- 1 January 2026
- Language
- EN